濺鍍機
儀器名稱 (Facility name)
濺鍍機 Sputtering system
規格與功能（Specifications and functions）
系統說明(System description)
本系統配備試片承載腔與濺鍍腔，可以快速更換基板而無須破壞濺鍍腔真空。系統真空長期維持在3x10-7 torr以下，但是本系統無基板加熱能力。
The system consists of a load-lock chamber and a deposition chamber, allowing fast substrate exchange without breaking the vacuum environment of the deposition chamber. The pressure of the deposition chamber can be maintained at 3x10-7 torr or lower consistently. However, no substrate heater is available.
真空度(Vacuum)：<3x10-7 torr (deposition chanber), ~5x10-6 torr (load-lock chamber)
濺鍍靶材尺寸(Sputtering target size)：f50 mm x 6 mm
濺鍍功率 (Sputtering power)：2 DC power source (150 W max.) and one RF power source (100 W max.)
基板尺寸 (Substrate size)：<50 mm in diameter
Substrate to target distance: 50-100 mm
功能：
- 單層薄膜濺鍍
Single-layer thin film deposition
- 雙靶或三靶共濺鍍單層薄膜
Co-sputter deposition from two or three sources
- 雙靶或三靶交替多層膜濺鍍
Multilayer deposition from two or three sources alternatively.
使用規定：
- 委託者請自備靶材，靶材規格為直徑2英吋、總厚度6 mm，非金屬靶背面需接合銅背板，總厚度6 mm。
Sputter targets should be prepared by the user. Non-conductive or ceramic/semiconductor targets should be bonded with copper plate with total thickness no more than 6 mm.
- 基板總大小單次不可超過直徑2英吋。
Substrate should be less than two inches in diameter.
3. 本系統單次濺鍍時間最長40分鐘
The sputter deposition for one sample should be shorter than 40 minutes.
- 靶材在濺鍍過程中損壞恕不賠償。
No compensation will be provided for target break during operation.
- 本系統使用氬離子濺鍍，不提供其他氣體濺鍍。
No gas source other than Ar can be provided.
收費標準(Service charge)
委託操作(Operator service)：
濺鍍：800元/小時
Sputters：800 NTD/hour
更換靶材：500元/次
Target exchange：500 NTD/
試片及靶材寄送：郵局報價為準
Sample/target delivery: regular or express delivery by Post Office
聯絡方式 (Contact information)
儀器指導教授 (Professor in-charge)：張六文教授 (Professor Liuwen Chang)
操作人員與聯絡人 (Operator)：林宥丞 (Mr. Y.-C. Lin)
聯絡電話(Tel)：07-5252000 #4099
電子信箱(e-mail)：roger11lin18@gmail.com
儀器地點(Location)：理工大樓二樓 工EN2026-3室(room 工EN2026-3)
開放時間 (Opening hours)
電話或電子郵件預約（reverse by telephone or e-mail）
Maximum service hours per week: 20 hours
